DocumentCode :
1399969
Title :
Effect of gate-field dependent mobility degradation on distortion analysis in MOSFETs
Author :
Van Langevelde, Ronald ; Klaassen, François M.
Author_Institution :
Electron. Devices Group, Eindhoven Univ. of Technol., Netherlands
Volume :
44
Issue :
11
fYear :
1997
fDate :
11/1/1997 12:00:00 AM
Firstpage :
2044
Lastpage :
2052
Abstract :
Compact MOSFET models in contemporary circuit simulators fail to accurately describe distortion effects. In the ohmic region of the MOSFET, this failure is mainly due to inaccurate modeling of the gate-field dependent mobility degradation effect. In this paper a new model for mobility degradation Is introduced which gives a major improvement in distortion analysis in the linear region for both n-type and p-type MOS transistors. Incorporating a gate voltage dependent series resistance, this model even gives good results for very short channel length devices
Keywords :
MOSFET; carrier mobility; circuit CAD; circuit analysis computing; electric distortion; inversion layers; semiconductor device models; MOSFET; circuit simulators; distortion analysis; gate-field dependent mobility degradation; linear region; ohmic region; p-type transistors; series resistance; short channel length devices; Analog circuits; Analytical models; Circuit simulation; Current-voltage characteristics; Degradation; Digital circuits; Failure analysis; MOSFET circuits; Predictive models; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.641382
Filename :
641382
Link To Document :
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