• DocumentCode
    1400828
  • Title

    High Current-Gain Implantation-Free 4H-SiC Monolithic Darlington Transistor

  • Author

    Ghandi, Reza ; Buono, Benedetto ; Domeij, Martin ; östling, Mikael

  • Author_Institution
    KTH R. Inst. of Technol., Kista, Sweden
  • Volume
    32
  • Issue
    2
  • fYear
    2011
  • Firstpage
    188
  • Lastpage
    190
  • Abstract
    An implantation-free 4H-SiC Darlington transistor with high current gain of 2900 (JC = 970 A/cm2 and VCE = 6 V) at room temperature is reported. The device demonstrates a record maximum current gain of 640 at 200°C, offering an attractive solution for high-temperature applications. The monolithic Darlington device exhibits an open-base breakdown voltage of 1 kV that is less than the optimum bulk breakdown due to isolation trench between the driver and the output bipolar junction transistor. On the same wafer, a monolithic Darlington pair with a nonisolated base layer was also fabricated. At room temperature, this device shows a maximum current gain of 1000 and an open-base breakdown voltage of 2.8 kV, which is 75% of the parallel-plane breakdown voltage.
  • Keywords
    bipolar transistors; high-temperature electronics; isolation technology; silicon compounds; wide band gap semiconductors; SiC; high current-gain implantation-free monolithic Darlington transistor; high-temperature applications; isolation trench; open-base breakdown voltage; output bipolar junction transistor; temperature 200 degC; voltage 1 kV; voltage 2.8 kV; 4H-SiC; Darlington transistor;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2090646
  • Filename
    5664756