Title :
A 3.3-V single power supply 16-Mb nonvolatile virtual DRAM using a NAND flash memory technology
Author :
Jung, Tae-Sung ; Choi, Do-Chan ; Cho, Sung-Hee ; Kim, Myong-Jae ; Lee, Seung-Keun ; Choi, Byung-Soon ; Yum, Jin-Sun ; Kim, San-Hong ; Lee, Dong-Gi ; Son, Jong-Chang ; Yong, Myung-Sik ; Oh, Heung-Kwun ; Jun, Sung-Bu ; Lee, Woung-Moo ; Haq, Ejaz ; Suh, Hang
Author_Institution :
DRAM Design, Samsung Electron. Co. Ltd., Kyungki-Do, South Korea
fDate :
11/1/1997 12:00:00 AM
Abstract :
A 3.3-V 16-Mb nonvolatile memory having operation virtually identical to DRAM with package pin compatibility has been developed. Read and write operations are fully DRAM compatible except for a longer RAS precharge time after write. Fast random access time of 63 ns with the NAND flash memory cell is achieved by using a hierarchical row decoder scheme and a unique folded bit-line architecture which also allows bit-by-bit program verify and inhibit operation. Fast page mode with a column address access time of 21 ns is achieved by sensing and latching 4 k cells simultaneously. To allow byte alterability, nonvolatile restore operation with self-contained erase is developed. Self-contained erase is word-line based, and increased cell disturb due to the word-line based erase is relaxed by adding a boosted bit-line scheme to a conventional self-boosting technique. The device is fabricated in a 0.5-μm triple-well, p-substrate CMOS process using two-metal and three-poly interconnect layers. A resulting die size is 86.6 mm2, and the effective cell size including the overhead of string select transistors is 2.0 μm2
Keywords :
CMOS memory circuits; DRAM chips; EPROM; NAND circuits; memory architecture; 0.5 micron; 16 Mbit; 21 ns; 3.3 V; 63 ns; NAND flash memory technology; RAS precharge time; boosted bit-line scheme; byte alterability; fast page mode; folded bit-line architecture; hierarchical row decoder scheme; nonvolatile restore operation; nonvolatile virtual DRAM; self-boosting technique; self-contained erase; single power supply; triple-well p-substrate CMOS process; two-metal/three-poly interconnect layers; Application software; CMOS process; Consumer electronics; Decoding; Flash memory; Flash memory cells; Nonvolatile memory; Packaging; Power supplies; Random access memory;
Journal_Title :
Solid-State Circuits, IEEE Journal of