DocumentCode :
1403641
Title :
Synthesis and field-emission properties of oriented GaN nanowires
Author :
Enling Li ; Xuhui Cheng ; Danna Zhao ; Rui Xu ; Meng Xi ; Zhen Cui ; Tao Zhao
Author_Institution :
Sci. Sch., Xi´an Univ. of Technol., Xi´an, China
Volume :
7
Issue :
12
fYear :
2012
fDate :
12/1/2012 12:00:00 AM
Firstpage :
1305
Lastpage :
1307
Abstract :
Oriented gallium nitride (GaN) nanowires grown on Pt-coated Si (111) substrates, were synthesised using the chemical vapour deposition method under different Ga sources. The characteristics of the grown GaN nanowires were investigated using scanning electron microscopy and X-ray diffraction, which found that the as-synthesised GaN nanowires of the three samples are of different orientation, and all displayed hexagonal wurtzite structures of GaN crystals. The electron field-emission properties of the three samples of GaN nanowires showed a low turn-on field of 4.5, 5.5 and 6.2 V/μm, respectively, and field enhancement factors of 1337, 2948 and 2599, respectively.
Keywords :
III-V semiconductors; X-ray diffraction; chemical vapour deposition; field emission; gallium compounds; nanofabrication; nanowires; scanning electron microscopy; wide band gap semiconductors; Ga sources; GaN; GaN crystals; Pt-Si; Pt-coated Si (111) substrates; X-ray diffraction; chemical vapour deposition; electron field-emission properties; field emission properties; field enhancement factor; hexagonal wurtzite structures; oriented GaN nanowires; scanning electron microscopy; turn-on field;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2012.0829
Filename :
6419620
Link To Document :
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