DocumentCode
1404763
Title
Semiconductor characterization and analytical technology
Author
Shaffner, Thomas J.
Author_Institution
Div. of Semicond. Electron., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Volume
88
Issue
9
fYear
2000
Firstpage
1416
Lastpage
1437
Abstract
The utility of semiconductor characterization techniques continues to be measured by industry requirements for smaller device geometry, atomically smooth surfaces and interfaces, and increased material purity. Those techniques that specialize in the microspot and structural analysis of microcircuits are reviewed in this paper with examples of applications to manufacturing and process development. Brief tutorials, case studies, and comparisons show how the strengths and weaknesses of each should be understood before selecting those methods most suitable for the problem at hand.
Keywords
chemical analysis; semiconductor technology; analytical technology; microcircuit; microspot analysis; semiconductor processing; structural analysis; Atomic measurements; Electrons; Manufacturing processes; Mass spectroscopy; Microscopy; Radiation detectors; Semiconductor materials; Signal analysis; Spatial resolution; Surface topography;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/5.883315
Filename
883315
Link To Document