• DocumentCode
    1404763
  • Title

    Semiconductor characterization and analytical technology

  • Author

    Shaffner, Thomas J.

  • Author_Institution
    Div. of Semicond. Electron., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • Volume
    88
  • Issue
    9
  • fYear
    2000
  • Firstpage
    1416
  • Lastpage
    1437
  • Abstract
    The utility of semiconductor characterization techniques continues to be measured by industry requirements for smaller device geometry, atomically smooth surfaces and interfaces, and increased material purity. Those techniques that specialize in the microspot and structural analysis of microcircuits are reviewed in this paper with examples of applications to manufacturing and process development. Brief tutorials, case studies, and comparisons show how the strengths and weaknesses of each should be understood before selecting those methods most suitable for the problem at hand.
  • Keywords
    chemical analysis; semiconductor technology; analytical technology; microcircuit; microspot analysis; semiconductor processing; structural analysis; Atomic measurements; Electrons; Manufacturing processes; Mass spectroscopy; Microscopy; Radiation detectors; Semiconductor materials; Signal analysis; Spatial resolution; Surface topography;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/5.883315
  • Filename
    883315