Title :
Semiconductor characterization and analytical technology
Author :
Shaffner, Thomas J.
Author_Institution :
Div. of Semicond. Electron., Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
Abstract :
The utility of semiconductor characterization techniques continues to be measured by industry requirements for smaller device geometry, atomically smooth surfaces and interfaces, and increased material purity. Those techniques that specialize in the microspot and structural analysis of microcircuits are reviewed in this paper with examples of applications to manufacturing and process development. Brief tutorials, case studies, and comparisons show how the strengths and weaknesses of each should be understood before selecting those methods most suitable for the problem at hand.
Keywords :
chemical analysis; semiconductor technology; analytical technology; microcircuit; microspot analysis; semiconductor processing; structural analysis; Atomic measurements; Electrons; Manufacturing processes; Mass spectroscopy; Microscopy; Radiation detectors; Semiconductor materials; Signal analysis; Spatial resolution; Surface topography;
Journal_Title :
Proceedings of the IEEE