• DocumentCode
    1404771
  • Title

    Modeling and characterization of an 80 V silicon LDMOSFET for emerging RFIC applications

  • Author

    Perugupalli, Prasanth ; Trivedi, Malay ; Shenai, Krishna ; Leong, S.K.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Illinois Univ., Chicago, IL, USA
  • Volume
    45
  • Issue
    7
  • fYear
    1998
  • fDate
    7/1/1998 12:00:00 AM
  • Firstpage
    1468
  • Lastpage
    1478
  • Abstract
    This paper describes the design and optimization of an 80 V silicon RF LDMOSFET used in a power amplifier for base station applications. The transistor was prototyped using the doping profiles extracted from an experimental device and extensive two-dimensional (2-D) simulations were performed to characterize the DC and RF performance of the device. A good match between the measured and simulated data is reported. A simple circuit model was developed which accurately predicts the DC and RF characteristics in circuit simulators. It is shown through 2-D simulations that the LDD region in the LDMOSFET can be modeled as a JFET. A methodology for the accurate extraction of model parameters for the circuit model is discussed. It is shown that the DC and RF performances of the circuit model closely match the measured data. Advanced mixed device and circuit simulations were used to obtain S-parameters of the device which provide new insights into device physics and also the basis for statistical process control studies
  • Keywords
    S-parameters; elemental semiconductors; power MOSFET; semiconductor device models; silicon; 80 V; DC characteristics; JFET model; LDD region; RF characteristics; RFIC; S-parameters; Si; base station; circuit model; design; doping profile; optimization; power amplifier; silicon LDMOSFET; statistical process control; two-dimensional simulation; Base stations; Circuit simulation; Data mining; Design optimization; Power amplifiers; Predictive models; Radio frequency; Radiofrequency amplifiers; Semiconductor process modeling; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.701477
  • Filename
    701477