DocumentCode :
1406761
Title :
Fabrication and characterisation of multipod ZnO nanostructures by CVD on Al2O3-coat Si (111) substrate
Author :
Peng Xu ; Huizhao Zhuang
Author_Institution :
Instn. of Semicond., Shandong Normal Univ., Jinan, China
Volume :
6
Issue :
12
fYear :
2011
fDate :
12/1/2011 12:00:00 AM
Firstpage :
985
Lastpage :
987
Abstract :
Multipod ZnO nanostructures were fabricated on Al2O3-coat Si (111) substrate by chemical vapour deposition method at 1050°C using the mixture of ZnO and C powders as source materials. X-ray diffraction, scanning electron microscopy, transmission electron microscopy and high-resolution transmission electron microscopy were used to synthesise the structure, morphology and microstructure of the multipod ZnO nanostructures. X-ray photoelectron spectroscopy was used to investigate the chemical composition of the multipod ZnO nanostructure. Finally, the growth mechanism of the multipod ZnO nanostructures was also discussed.
Keywords :
II-VI semiconductors; X-ray diffraction; X-ray photoelectron spectra; chemical vapour deposition; nanofabrication; nanoparticles; scanning electron microscopy; semiconductor growth; transmission electron microscopy; wide band gap semiconductors; zinc compounds; Al2O3-Si; X-ray diffraction; X-ray photoelectron spectroscopy; ZnO; chemical composition; chemical vapour deposition; high-resolution transmission electron microscopy; microstructure; nanofabrication; nanostructured material; powder; scanning electron microscopy; temperature 1050 degC; transmission electron microscopy;
fLanguage :
English
Journal_Title :
Micro & Nano Letters, IET
Publisher :
iet
ISSN :
1750-0443
Type :
jour
DOI :
10.1049/mnl.2011.0523
Filename :
6111566
Link To Document :
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