• DocumentCode
    1406761
  • Title

    Fabrication and characterisation of multipod ZnO nanostructures by CVD on Al2O3-coat Si (111) substrate

  • Author

    Peng Xu ; Huizhao Zhuang

  • Author_Institution
    Instn. of Semicond., Shandong Normal Univ., Jinan, China
  • Volume
    6
  • Issue
    12
  • fYear
    2011
  • fDate
    12/1/2011 12:00:00 AM
  • Firstpage
    985
  • Lastpage
    987
  • Abstract
    Multipod ZnO nanostructures were fabricated on Al2O3-coat Si (111) substrate by chemical vapour deposition method at 1050°C using the mixture of ZnO and C powders as source materials. X-ray diffraction, scanning electron microscopy, transmission electron microscopy and high-resolution transmission electron microscopy were used to synthesise the structure, morphology and microstructure of the multipod ZnO nanostructures. X-ray photoelectron spectroscopy was used to investigate the chemical composition of the multipod ZnO nanostructure. Finally, the growth mechanism of the multipod ZnO nanostructures was also discussed.
  • Keywords
    II-VI semiconductors; X-ray diffraction; X-ray photoelectron spectra; chemical vapour deposition; nanofabrication; nanoparticles; scanning electron microscopy; semiconductor growth; transmission electron microscopy; wide band gap semiconductors; zinc compounds; Al2O3-Si; X-ray diffraction; X-ray photoelectron spectroscopy; ZnO; chemical composition; chemical vapour deposition; high-resolution transmission electron microscopy; microstructure; nanofabrication; nanostructured material; powder; scanning electron microscopy; temperature 1050 degC; transmission electron microscopy;
  • fLanguage
    English
  • Journal_Title
    Micro & Nano Letters, IET
  • Publisher
    iet
  • ISSN
    1750-0443
  • Type

    jour

  • DOI
    10.1049/mnl.2011.0523
  • Filename
    6111566