DocumentCode :
1407570
Title :
Noise Figure Improvement in InP-Based HEMTs Using Wide Gate Head and Cavity Structure
Author :
Takahashi, Tsuyoshi ; Sato, Masaru ; Nakasha, Yasuhiro ; Hirose, Tatsuya ; Hara, Naoki
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
Volume :
33
Issue :
2
fYear :
2012
Firstpage :
206
Lastpage :
208
Abstract :
The minimum noise figure (NFmin) at 94 GHz was improved effectively by employing a cavity structure in the interconnection process, even though a wide gate head was used in InP-based high-electron-mobility transistors (HEMTs). The wide gate head is effective in improving NFmin since gate resistance is reduced, while increased parasitic capacitance at a passivated gate affects the noise figure. Then, the parasitic capacitance was eliminated successfully by employing a cavity structure around the gate region. We measured an NFmin of 0.9 dB when the cavity structure was employed in the wide-gate-head HEMTs.
Keywords :
high electron mobility transistors; indium compounds; HEMT; InP; cavity structure; frequency 94 GHz; gate resistance; high-electron-mobility transistors; interconnection process; noise figure 0.9 dB; noise figure improvement; parasitic capacitance; passivated gate; wide gate head; Cavity resonators; HEMTs; Logic gates; MODFETs; Noise; Parasitic capacitance; Cavity; gate head; high-electron-mobility transistor (HEMT); noise figure;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2175360
Filename :
6112178
Link To Document :
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