• DocumentCode
    1407570
  • Title

    Noise Figure Improvement in InP-Based HEMTs Using Wide Gate Head and Cavity Structure

  • Author

    Takahashi, Tsuyoshi ; Sato, Masaru ; Nakasha, Yasuhiro ; Hirose, Tatsuya ; Hara, Naoki

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi, Japan
  • Volume
    33
  • Issue
    2
  • fYear
    2012
  • Firstpage
    206
  • Lastpage
    208
  • Abstract
    The minimum noise figure (NFmin) at 94 GHz was improved effectively by employing a cavity structure in the interconnection process, even though a wide gate head was used in InP-based high-electron-mobility transistors (HEMTs). The wide gate head is effective in improving NFmin since gate resistance is reduced, while increased parasitic capacitance at a passivated gate affects the noise figure. Then, the parasitic capacitance was eliminated successfully by employing a cavity structure around the gate region. We measured an NFmin of 0.9 dB when the cavity structure was employed in the wide-gate-head HEMTs.
  • Keywords
    high electron mobility transistors; indium compounds; HEMT; InP; cavity structure; frequency 94 GHz; gate resistance; high-electron-mobility transistors; interconnection process; noise figure 0.9 dB; noise figure improvement; parasitic capacitance; passivated gate; wide gate head; Cavity resonators; HEMTs; Logic gates; MODFETs; Noise; Parasitic capacitance; Cavity; gate head; high-electron-mobility transistor (HEMT); noise figure;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2175360
  • Filename
    6112178