DocumentCode :
1407933
Title :
Vacuum microelectronics: what´s new and exciting
Author :
Utsumi, Takao
Author_Institution :
Canon Res. Center, Atsugi, Japan
Volume :
38
Issue :
10
fYear :
1991
fDate :
10/1/1991 12:00:00 AM
Firstpage :
2276
Lastpage :
2283
Abstract :
It is argued that the key factor required to make vacuum microelectronics successful is closely related to an understanding and control of the physics, materials and microfabrication technology for field emitter arrays (FEAs). The topics discussed are the optimization and theoretical limit of the FEA; thermal stability of the FEA and the mesoscopic FEA; fabrication and materials of FEAs; and characteristics of FEAs. The author examines basic characteristics, limits and capabilities of FEAs from the viewpoint of optimizing the concept of the most current for the least voltage
Keywords :
cathodes; electron field emission; stability; vacuum microelectronics; fabrication; field emitter arrays; materials; microfabrication technology; thermal stability; vacuum microelectronics; Electric breakdown; Electrodes; Electrons; Fabrication; Geometry; Microelectronics; Microscopy; Surface cleaning; Vacuum breakdown; Vacuum technology;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.88510
Filename :
88510
Link To Document :
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