Title :
Design of high-vacuum test station for rapid evaluation of vacuum microelectronic devices
Author :
Busta, H.H. ; Pogemiller, J.E. ; Zimmerman, B.J.
Author_Institution :
Amoco Technol. Co., Naperville, IL, USA
fDate :
10/1/1991 12:00:00 AM
Abstract :
A vacuum test station has been designed allowing for rapid evaluation of vacuum microelectronic devices. The system consists of a turbo-pumped vacuum chamber reaching a base pressure, at room temperature, of 3×10-9 torr. Devices which are fabricated on silicon or fused silica substrates are placed on a copper base which is part of a cold finger cryostat. Test temperatures can be varied from 20 to 500 K. Baking of the devices can be accomplished by thin-film heating elements integrated onto the substrates or by heating coils placed inside the chamber. Cleaning of electrode surfaces can be performed via an argon ion gun system and/or by electron bombardment. The performance of the system is demonstrated for a Spindt emitter array
Keywords :
electron field emission; electronic equipment testing; surface treatment; vacuum apparatus; vacuum microelectronics; 20 to 500 K; 3E-9 torr; Ar ion gun system; Cu base; Si substrates; SiO2 substrates; Spindt emitter array; base pressure; cold finger cryostat; device baking; electrode surface cleaning; electron bombardment; heating coils; high-vacuum test station; rapid evaluation; room temperature; thin-film heating elements; turbo-pumped vacuum chamber; vacuum microelectronic devices; Copper; Fingers; Heating; Microelectronics; Silicon compounds; Substrates; Temperature; Testing; Thin film devices; Vacuum systems;
Journal_Title :
Electron Devices, IEEE Transactions on
