• DocumentCode
    1408939
  • Title

    Simulation of “Ab Initio” Quantum Confinement Scattering in UTB MOSFETs Using Three-Dimensional Ensemble Monte Carlo

  • Author

    Riddet, Craig ; Alexander, Craig ; Brown, Andrew R. ; Roy, Scott ; Asenov, Asen

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Univ. of Glasgow, Glasgow, UK
  • Volume
    58
  • Issue
    3
  • fYear
    2011
  • fDate
    3/1/2011 12:00:00 AM
  • Firstpage
    600
  • Lastpage
    608
  • Abstract
    In this paper, we report a 3-D Monte Carlo (MC) simulation methodology that includes complex quantum confinement effects captured through the introduction of robust and efficient density gradient (DG) quantum corrections (QCs), which has been used to introduce “ab initio ” scattering from quantum confinement fluctuations in ultrathin body silicon-on-insulator metal-oxide-semiconductor field-effect transistors (MOSFETs) through the real space trajectories of the particles driven by the DG effective quantum potential and to study the enhanced current variability due to the corresponding transport variations. A “frozen field” approximation, where neither the field nor the QCs are updated, has been used to examine the dependence of mobility on silicon thickness in large self-averaging devices. This approximation, along with the MC simulations that are self-consistent with Poisson´s equation, is applied to study the variability of on-current due to random body thickness fluctuations in thin-body MOSFETs at low and high drain biases.
  • Keywords
    MOSFET; Monte Carlo methods; Poisson equation; silicon-on-insulator; 3D Monte Carlo simulation; Poisson equation; UTB MOSFET; ab initio quantum confinement scattering; complex quantum confinement; density gradient quantum corrections; metal-oxide-semiconductor field-effect transistors; quantum confinement fluctuations; ultrathin body silicon-on-insulator; Drift diffusion (DD); MOSFET; Monte Carlo (MC); double gate; quantum corrections; scattering; silicon-on-insulator (SOI); variability;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2095422
  • Filename
    5672594