DocumentCode
1408981
Title
Frequency response of AlInAs/GaInAs/InP modulation-doped field-effect transistors at cryogenic temperatures
Author
Adesida, I. ; Laskar, J. ; Boor, S. ; Reis, Sandro ; Ketterson, Andrew ; Cho, Andrew Y. ; Fischer, Ray ; Sivco, D.
Volume
35
Issue
12
fYear
1988
fDate
12/1/1988 12:00:00 AM
Firstpage
2442
Abstract
The microwave S -parameters of MODFETs have been measured at 300 and 90 K up to a frequency of 26.5 GHz. Measurements were made using a microwave network analyzer and a probe station that was modified for liquid-nitrogen-cooled operation. The MODFET layers included an Si-doped Al0.48In0.52As barrier and an undoped Ga 0.47In0.53As channel grown by molecular-beam epitaxy on a semi-insulating InP substrate. Results indicate a striking difference between the high-frequency responses at the two temperatures. At low frequencies the gain is higher at 90 K, where the maximum unilateral gain G u at 1 GHz is 28 dB at 90 K vs. 20 dB at 300 K. At 300 K, G u rolls off at 6 dB/octave and the maximum frequency of oscillations f max, is 51 GHz. However, at 90 K, the gain roll-off steepens to 12 dB/octave and f max is only 21 GHz. The roll-off in current gain is 6 dB/octave at both temperatures, and the current gain cutoff frequency, f T, is 33 GHz at 300 K and 41 GHz at 90 K. It was found that GaInAs MODFETs can have a lower frequency response at cryogenic temperatures than at room temperature. The measured 12 dB/octave roll-off rate of G u indicates a second pole in the device response function
Keywords
III-V semiconductors; S-parameters; aluminium compounds; cryogenics; frequency response; gallium arsenide; high electron mobility transistors; indium compounds; solid-state microwave devices; 1 to 51 GHz; 20 dB; 28 dB; 300 K; 90 K; Al0.48In0.52As:Si-Ga0.47In 0.53As-InP; III-V semiconductors; MBE; MODFETs; Si-doped Al0.48In0.52As barrier; cryogenic temperatures; frequency response; high-frequency responses; liquid-nitrogen-cooled operation; microwave S-parameters; microwave transistor; modulation-doped field-effect transistors; molecular-beam epitaxy; semi-insulating InP substrate; undoped Ga0.47In0.53As channel; Epitaxial layers; Frequency measurement; Frequency response; HEMTs; Indium phosphide; MODFETs; Microwave measurements; Molecular beam epitaxial growth; Probes; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.8862
Filename
8862
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