• DocumentCode
    1409013
  • Title

    Numerical investigation of the swirl gas angle and arc current dependence on evaporation of hafnium cathode in a plasma cutting arc

  • Author

    Long, Nguyen Phi ; Tanaka, Yasunori ; Uesugi, Yoshihiko

  • Author_Institution
    Div. of Electr. Eng. & Comput. Sci., Kanazawa Univ., Kanazawa, Japan
  • Volume
    40
  • Issue
    2
  • fYear
    2012
  • Firstpage
    497
  • Lastpage
    504
  • Abstract
    The effects of arc current and swirl gas angle on a plasma cutting arc are investigated using a 2-D thermofluid model developed for arc plasma with consideration of hafnium (Hf) cathode evaporation. Numerical modeling is extremely important to predict the erosion amount of Hf cathode for different process parameters in plasma cutting arcs. Results show that a larger swirl gas angle causes a high-temperature plasma area in front of the cathode surface shrunken in the radial direction and that the flow patterns changed to the opposite direction in front of the cathode at swirl gas angles from 12° to 30°. This change in the gas flow pattern induces Hf vapor transport along the center-axis direction to the nozzle outlet. With the increase of arc current, the whole temperature field markedly increases, and the radius of arc plasma is expanded in the radial direction. The total amount of mass loss of Hf cathode evaporation was predicted to be enhanced with increasing arc current and swirl gas angle from 12°.
  • Keywords
    arc cutting; cathodes; evaporation; hafnium; nozzles; numerical analysis; plasma flow; plasma materials processing; plasma temperature; swirling flow; 2D thermofluid model; Hf; arc current dependence; erosion; gas flow pattern; hafnium cathode evaporation; high-temperature plasma area; mass loss; nozzle; numerical investigation; plasma cutting arc; swirl gas angle; temperature field; Cathodes; Equations; Hafnium; Mathematical model; Plasma temperature; Solids; Erosion of cathode; hafnium evaporation; plasma cutting arcs; swirl gas flow;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2178436
  • Filename
    6112688