DocumentCode
1409498
Title
A model-based approach for process design and its application to the titanium salicide process
Author
Apte, Pushkar P. ; Saxena, Sharad ; Rao, Suraj ; Prinslow, Douglas A. ; Kittl, Jorge A. ; Pollack, Gordon P.
Author_Institution
Texas Instrum. Inc., Dallas, TX, USA
Volume
11
Issue
3
fYear
1998
fDate
8/1/1998 12:00:00 AM
Firstpage
475
Lastpage
485
Abstract
Process technology development constitutes a significant cost in manufacturing integrated circuits. In this paper, we present a model-based approach for developing new process technology rapidly and inexpensively, using the salicide process to demonstrate the concepts. This approach is applied to evaluate performance tradeoffs, to develop insight into the underlying process physics, to quantify the impact of the salicide process on the device and circuit performance, and to estimate the process variability. The key idea of this approach is to group a sequence of process steps into a process module, and build simple and accurate process models for the module. The paper also illustrates the use of this model-based approach in synthesizing optimal processes rapidly based on requirements, contributing to the reduction of technology development cost and cycle time
Keywords
integrated circuit manufacture; integrated circuit metallisation; optimisation; semiconductor process modelling; titanium compounds; IC manufacturing; TiSi2; cycle time; model-based approach; optimal processes; performance tradeoffs; process design; process physics; process technology; process variability; salicide process; technology development cost; CMOS technology; Costs; Implants; Integrated circuit manufacture; Integrated circuit technology; Manufacturing processes; Process design; Semiconductor device modeling; Silicon; Titanium;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.705382
Filename
705382
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