• DocumentCode
    1409641
  • Title

    A Compact Capacitor-Less High-Speed DRAM Using Field Effect-Controlled Charge Regeneration

  • Author

    Wan, J. ; Le Royer, C. ; Zaslavsky, A. ; Cristoloveanu, S.

  • Author_Institution
    IMEP-LAHC, MINATEC, Grenoble, France
  • Volume
    33
  • Issue
    2
  • fYear
    2012
  • Firstpage
    179
  • Lastpage
    181
  • Abstract
    We demonstrate experimentally a capacitor-less one-transistor dynamic random access memory (DRAM) based on fully depleted silicon-on-insulator substrate. In our device, the charges are directly stored in front gate capacitor (CG) and read out through a fast feedback regeneration process. The simulated read/write times of our device reach below 1 ns, much faster than conventional 1T-1C DRAM. The read/write biasing voltages can be scaled down to 1.1 V, achieving long retention time (tre >; 5s).
  • Keywords
    DRAM chips; silicon-on-insulator; SOI; compact capacitor-less high-speed DRAM; conventional 1T-1C DRAM; dynamic random access memory; fast feedback regeneration process; field effect-controlled charge regeneration; front gate capacitor; fully depleted silicon-on-insulator substrate; read-write biasing voltages; retention time; simulated read-write times; Capacitors; Charge carrier processes; FETs; Junctions; Logic gates; Random access memory; Writing; Capacitor-less; dynamic random access memory (DRAM); feedback; high speed;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2011.2176908
  • Filename
    6112790