• DocumentCode
    1409728
  • Title

    Measurement of bandgap narrowing effects in p-GaAs and implications for AlGaAs/GaAs HBT performance

  • Author

    DeMoulin, P.D. ; Lundstrom, Mark S. ; Melloch, M.R. ; Tobin, S.P.

  • Volume
    35
  • Issue
    12
  • fYear
    1988
  • fDate
    12/1/1988 12:00:00 AM
  • Firstpage
    2445
  • Abstract
    The authors report the first electrical measurements of bandgap narrowing effects in p+-GaAs and explore their influence on the performance of AlGaAs/GaAs heterojunction bipolar transistors (HBTs). A sequential etch technique was used to measure electron injection currents in MOCVD (metalorganic vapor-phase epitaxy)-grown p +-n GaAs diodes with Zn dopant concentrations ranging from 6.3×1017 to 1.3×1019 cm-3. The measurement consisted essentially of characterizing the n=1 electron injection current as a function of thickness of the p-type layer. From the measured n=1 saturation current density, the product, nie2Dn was determined, where nie is the effective intrinsic carrier concentration and Dn is the minority-carrier diffusion coefficient. This product was observed to increase greatly with doping and was still a factor of two to three greater than expected, even when bandgap shrinkage was accounted for. This affects AlGaAs/GaAs n-p-n HBTs by increasing the electron current injected into the base. Bandgap narrowing effects increase the collector current by more than one order of magnitude when the base doping exceeds 1019 cm-3. These results demonstrate the importance of treating bandgap narrowing effects when modeling and designing HBTs
  • Keywords
    III-V semiconductors; aluminium compounds; energy gap; etching; gallium arsenide; heterojunction bipolar transistors; vapour phase epitaxial growth; AlGaAs-GaAs; GaAs:Zn; HBT performance; III-V semiconductors; MOCVD; Zn dopant concentrations; bandgap narrowing effects; effective intrinsic carrier concentration; electrical measurements; electron injection currents; heterojunction bipolar transistors; metalorganic vapor-phase epitaxy; minority-carrier diffusion coefficient; p+-GaAs; p+-n GaAs diodes; sequential etch technique; Current measurement; Diodes; Doping; Electric variables measurement; Electrons; Etching; Gallium arsenide; Heterojunction bipolar transistors; MOCVD; Photonic band gap;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.8870
  • Filename
    8870