• DocumentCode
    1409777
  • Title

    On the frequency dependent drain conductance of ion-implanted GaAs MESFETs

  • Author

    Nakajima, Shigeru ; Yanagisawa, Masaki ; Tsumura, Eiji ; Sakurada, Takashi

  • Author_Institution
    Optoelectron. R&D Labs., Sumitomo Electr. Ind. Ltd., Yokohama, Japan
  • Volume
    47
  • Issue
    12
  • fYear
    2000
  • fDate
    12/1/2000 12:00:00 AM
  • Firstpage
    2255
  • Lastpage
    2260
  • Abstract
    The effect of MESFET structure on the frequency dispersion of drain conductance (gd) was examined, It was found that a shorter gate length, lower buried p-layer concentration, lower sheet resistance of n+ layer, and thinner active layer thickness are effective in suppressing the frequency dependent gd. These phenomena are explained by the presence of deep traps in the depletion layer between the semi-insulating substate and active layer. We also show that the cross-point change of eye-pattern for density of input signal in logic ICs is due to frequency dependent gd The cross-point change between mark ratio of 1/8 and 7/8 shows a linear relationship with gdRF/gddc (the ratio of the drain conductance at RF and dc input), These results indicate that an optimized device structure with gd small frequency dispersion can be used to realize high-speed and high quality logic ICs.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; deep levels; electron traps; gallium arsenide; semiconductor device measurement; GaAs; active layer; active layer thickness; buried p-layer concentration; cross-point change; deep traps; depletion layer; eye-pattern; frequency dependent drain conductance; gate length; ion-implanted MESFETs; logic ICs; mark ratio; optimized device structure; semi-insulating substate; sheet resistance; Annealing; Dispersion; Electrodes; Frequency dependence; Gallium arsenide; High speed integrated circuits; Laboratories; Logic devices; MESFETs; Research and development;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.887005
  • Filename
    887005