DocumentCode
1409777
Title
On the frequency dependent drain conductance of ion-implanted GaAs MESFETs
Author
Nakajima, Shigeru ; Yanagisawa, Masaki ; Tsumura, Eiji ; Sakurada, Takashi
Author_Institution
Optoelectron. R&D Labs., Sumitomo Electr. Ind. Ltd., Yokohama, Japan
Volume
47
Issue
12
fYear
2000
fDate
12/1/2000 12:00:00 AM
Firstpage
2255
Lastpage
2260
Abstract
The effect of MESFET structure on the frequency dispersion of drain conductance (gd) was examined, It was found that a shorter gate length, lower buried p-layer concentration, lower sheet resistance of n+ layer, and thinner active layer thickness are effective in suppressing the frequency dependent gd. These phenomena are explained by the presence of deep traps in the depletion layer between the semi-insulating substate and active layer. We also show that the cross-point change of eye-pattern for density of input signal in logic ICs is due to frequency dependent gd The cross-point change between mark ratio of 1/8 and 7/8 shows a linear relationship with gdRF/gddc (the ratio of the drain conductance at RF and dc input), These results indicate that an optimized device structure with gd small frequency dispersion can be used to realize high-speed and high quality logic ICs.
Keywords
III-V semiconductors; Schottky gate field effect transistors; deep levels; electron traps; gallium arsenide; semiconductor device measurement; GaAs; active layer; active layer thickness; buried p-layer concentration; cross-point change; deep traps; depletion layer; eye-pattern; frequency dependent drain conductance; gate length; ion-implanted MESFETs; logic ICs; mark ratio; optimized device structure; semi-insulating substate; sheet resistance; Annealing; Dispersion; Electrodes; Frequency dependence; Gallium arsenide; High speed integrated circuits; Laboratories; Logic devices; MESFETs; Research and development;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.887005
Filename
887005
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