Nonoptical characterization techniques for uncooled microbolometer infrared sensors

Infrared image sensors based on micromachined microbolometers can be integrated with CMOS addressing, readout, and signal processing circuitry. Testing of such sensors in the commercial environment must be rapid and cost effective, hence, other diagnostic techniques are preferred to optical testing wherever possible. Accordingly, this paper presents nonoptical techniques for characterising microbolometer-based IR sensors. From measurements of microbolometer resistance, thermal conductivity, and temperature coefficient of resistance, sensor fixed pattern noise and temperature response nonuniformity are determined. These measurements also provide feedback on the fabrication process parameters and defects.