An extended interaction oscillator based on a complex resonator structure

Author

Chen, Leeming ; Guo, Hezhong ; Chen, Han-Ying ; Tsao, Ming-Hsiung ; Yang, Tz-Te ; Tsai, Yi-Chin ; Chu, Kwo Ray

Author_Institution

Dept. of Phys., Nat. Tsing Hua Univ., Hsinchu, Taiwan

Volume

28

Issue

3

fYear

2000

fDate

6/1/2000 12:00:00 AM

Firstpage

626

Lastpage

632

Abstract

We report experimental investigation of a novel scheme for efficient interaction between a linear electron beam and an electromagnetic wave in a complex extended interaction structure. The structure of interest consists of a high R/Q, five-gap, coupled-cavity resonator that incorporates a coaxial section of a quarter plasma wavelength placed between the first and second cavities. In the coaxial section, beam and wave propagate in separate channels. The first cavity, strongly coupled to the other cavities through the wave channel of the coaxial section, serves as a buncher cavity. An inner channel running through the center conductor of the coaxial section provides a cutoff drift space for ballistic bunching of electrons, an effect that is shown to significantly enhance the interaction efficiency. Oscillation power of 2.2 kW at 16.6 GHz was demonstrated with an interaction efficiency of 30%. The total efficiency was further increased to 41% by incorporation of a two-stage depressed collector

Keywords

cavity resonators; coaxial waveguides; electron beams; electron guns; electron tube testing; microwave generation; microwave oscillators; particle beam bunching; 16.6 GHz; 2.2 kW; 30 percent; 41 percent; ballistic bunching; buncher cavity; center conductor; coaxial section; complex extended interaction structure; complex resonator structure; cutoff drift space; electromagnetic wave; electron bunching; extended interaction oscillator; five-gap coupled-cavity resonator; inner channel; interaction efficiency; linear electron beam; oscillation power; quarter plasma wavelength; total efficiency; two-stage depressed collector; wave channel; Coaxial components; Conductors; Electromagnetic propagation; Electromagnetic scattering; Electron beams; Klystrons; Millimeter wave technology; Oscillators; Physics; Plasma waves;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.887688

Filename

887688