DocumentCode
1412025
Title
Influence of Tin Deposition Methods on Tin Whisker Formation
Author
Piñol, Lesly A. ; Melngailis, John ; Charles, Harry K., Jr. ; Lee, David M. ; Deacon, Ryan ; Coles, George ; Clatterbaugh, Guy
Author_Institution
Johns Hopkins Univ. Appl. Phys. Lab., Laurel, MD, USA
Volume
1
Issue
12
fYear
2011
Firstpage
2028
Lastpage
2032
Abstract
The effect of pure tin deposition method on the propensity to form tin whiskers was studied over the course of one year. Deposition methods employed include matte and bright electroplating, electroless plating, sputtering, and evaporation (crucible resistive and electron beam). Films produced under high vacuum, via electron beam evaporation or DC sputtering, were found to whisker immediately, while matte electroplated and electroless plated films took 9 weeks to form whiskers. Films formed by resistive evaporation and bright electroplating displayed no whisker starts after more than a year of ambient aging. Film thickness and average grain size were not found to impact whisker propensity.
Keywords
ageing; electroless deposition; electron beam deposition; electroplating; grain size; metallic thin films; sputter deposition; tin; vacuum deposition; whiskers (crystal); DC sputtering; Sn; ambient aging; average grain size; bright electroplating; electroless plated film; electroless plating; electron beam evaporation; film thickness; matte electroplated film; matte electroplating; pure tin deposition method; resistive evaporation; tin whisker formation; whisker propensity; Educational institutions; Electron beams; Laboratories; Lead; Sputtering; Tin; Lead free; microelectronics reliability; physical vapor deposition; thin films; tin whiskering;
fLanguage
English
Journal_Title
Components, Packaging and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
2156-3950
Type
jour
DOI
10.1109/TCPMT.2011.2167338
Filename
6119122
Link To Document