Fabrication Insensitive Echelle Grating in Silicon-on-Insulator Platform

Author

Feng, Dazeng ; Qian, Wei ; Liang, Hong ; Kung, Cheng-Chih ; Fong, Joan ; Luff, B. Jonathan ; Asghari, Mehdi

Author_Institution

Kotura Inc., Monterey Park, CA, USA

Volume

23

Issue

5

fYear

2011

fDate

3/1/2011 12:00:00 AM

Firstpage

284

Lastpage

286

Abstract

We demonstrate a compact, low crosstalk, low loss, and flat passband demultiplexer based on an echelle grating fabricated in the silicon-on-insulator (SOI) platform. The demonstrated 12 channel demultiplexer has an 8-nm channel spacing, 5.5-nm flat passband, 1.7-dB on-chip loss, and better than 25-dB optical crosstalk. By arranging the output waveguides very close to the zero degree angle of the echelle grating, the performance of the demonstrated device is made insensitive to the vertical angle of the grating facet. The fabricated devices have a very small footprint and have the potential to provide a low-cost demultiplexer solution for multichannel data transmission applications.

Keywords

channel spacing; demultiplexing equipment; diffraction gratings; optical communication equipment; optical crosstalk; optical fabrication; silicon-on-insulator; SOI; Si; channel spacing; echelle grating; flat passband demultiplexer; loss 1.7 dB; optical crosstalk; silicon-on-insulator; Diffraction gratings; photonic integrated circuit; silicon-on-insulator (SOI); wavelength-division multiplexing (WDM);

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2010.2102347

Filename

5675664