DocumentCode
1412220
Title
Low temperature vacuum ultraviolet annealing of ZrO2 optical coatings grown by laser ablation
Author
Craciun, V. ; Craciun, D. ; Boyd, I.W.
Author_Institution
Laser Dept., Nat. Inst. for Laser, Plasma & Radiat. Phys., Bucharest, Romania
Volume
34
Issue
15
fYear
1998
fDate
7/23/1998 12:00:00 AM
Firstpage
1527
Lastpage
1528
Abstract
The effect of post-deposition low temperature annealing treatment of ZrO2 thin films, grown by laser ablation using vacuum ultraviolet (VUV) radiation emitted by an excimer lamp, was investigated. The optical absorption coefficient of the films was reduced by more than one order of magnitude after annealing while the refractive index increased, reaching values similar to those recorded for the bulk material. The treatment was especially effective for films grown at modest substrate temperatures. After VUV annealing for 1h at 350°C, films deposited at only 300°C exhibited a lower optical absorption than films grown at 550°C
Keywords
absorption coefficients; energy gap; incoherent light annealing; optical films; pulsed laser deposition; refractive index; zirconium compounds; 1 hr; 300 C; 350 C; ZrO2; ZrO2 optical coatings; excimer lamp; laser ablation; low temperature VUV annealing; optical absorption coefficient; optical bandgap; post-deposition annealing treatment; refractive index; thin films; vacuum ultraviolet annealing;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19981048
Filename
706268
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