DocumentCode :
1412220
Title :
Low temperature vacuum ultraviolet annealing of ZrO2 optical coatings grown by laser ablation
Author :
Craciun, V. ; Craciun, D. ; Boyd, I.W.
Author_Institution :
Laser Dept., Nat. Inst. for Laser, Plasma & Radiat. Phys., Bucharest, Romania
Volume :
34
Issue :
15
fYear :
1998
fDate :
7/23/1998 12:00:00 AM
Firstpage :
1527
Lastpage :
1528
Abstract :
The effect of post-deposition low temperature annealing treatment of ZrO2 thin films, grown by laser ablation using vacuum ultraviolet (VUV) radiation emitted by an excimer lamp, was investigated. The optical absorption coefficient of the films was reduced by more than one order of magnitude after annealing while the refractive index increased, reaching values similar to those recorded for the bulk material. The treatment was especially effective for films grown at modest substrate temperatures. After VUV annealing for 1h at 350°C, films deposited at only 300°C exhibited a lower optical absorption than films grown at 550°C
Keywords :
absorption coefficients; energy gap; incoherent light annealing; optical films; pulsed laser deposition; refractive index; zirconium compounds; 1 hr; 300 C; 350 C; ZrO2; ZrO2 optical coatings; excimer lamp; laser ablation; low temperature VUV annealing; optical absorption coefficient; optical bandgap; post-deposition annealing treatment; refractive index; thin films; vacuum ultraviolet annealing;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19981048
Filename :
706268
Link To Document :
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