DocumentCode
1412438
Title
Improvement of GMR characteristics in [Ni81Fe19 /Cu] multilayers by interfacial modulation technique using Kr ions
Author
Miyamoto, Yasuyoshi ; Watanabe, Kentaro ; Nishimura, Koichi ; Nakagawa, Shigeki ; Naoe, Masahiko
Author_Institution
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
Volume
34
Issue
4
fYear
1998
fDate
7/1/1998 12:00:00 AM
Firstpage
921
Lastpage
923
Abstract
Ni81Fe19/Cu multilayers with giant magnetoresistive effect were deposited by dual ion beam sputtering method. Interfacial modulation technique using Ar or Kr ion bombardment to the interfaces of Ni-Fe/Cu multilayers could change the interfacial conditions, such as sharp interface, local mixing and interfacial diffusion. Kr was used as sputtering gas to reduce the damage of growing films by recoiled particles. The effect of Kr ion bombardment to the interfaces at restricted acceleration voltage of 100 V and reduction of residual stress seems to be effective for decreasing the film resistivity and increasing the MR ratio up to 17.8 % at room temperature
Keywords
copper; ferromagnetic materials; giant magnetoresistance; iron alloys; magnetic multilayers; nickel alloys; soft magnetic materials; sputtered coatings; 100 V; Ni81Fe19-Cu; [Ni81Fe19/Cu] multilayers; dual ion beam sputtering method; giant magnetoresistive effect; interfacial diffusion; interfacial modulation technique; local mixing; sharp interface; Acceleration; Argon; Conductivity; Giant magnetoresistance; Ion beams; Iron; Magnetic multilayers; Residual stresses; Sputtering; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.706312
Filename
706312
Link To Document