Title :
Improvement of GMR characteristics in [Ni81Fe19 /Cu] multilayers by interfacial modulation technique using Kr ions
Author :
Miyamoto, Yasuyoshi ; Watanabe, Kentaro ; Nishimura, Koichi ; Nakagawa, Shigeki ; Naoe, Masahiko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
7/1/1998 12:00:00 AM
Abstract :
Ni81Fe19/Cu multilayers with giant magnetoresistive effect were deposited by dual ion beam sputtering method. Interfacial modulation technique using Ar or Kr ion bombardment to the interfaces of Ni-Fe/Cu multilayers could change the interfacial conditions, such as sharp interface, local mixing and interfacial diffusion. Kr was used as sputtering gas to reduce the damage of growing films by recoiled particles. The effect of Kr ion bombardment to the interfaces at restricted acceleration voltage of 100 V and reduction of residual stress seems to be effective for decreasing the film resistivity and increasing the MR ratio up to 17.8 % at room temperature
Keywords :
copper; ferromagnetic materials; giant magnetoresistance; iron alloys; magnetic multilayers; nickel alloys; soft magnetic materials; sputtered coatings; 100 V; Ni81Fe19-Cu; [Ni81Fe19/Cu] multilayers; dual ion beam sputtering method; giant magnetoresistive effect; interfacial diffusion; interfacial modulation technique; local mixing; sharp interface; Acceleration; Argon; Conductivity; Giant magnetoresistance; Ion beams; Iron; Magnetic multilayers; Residual stresses; Sputtering; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
