Probability theory of electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions for particle modeling of materials processing plasmas and cases

Author

Nanbu, Kenichi

Author_Institution

Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan

Volume

28

Issue

3

fYear

2000

fDate

6/1/2000 12:00:00 AM

Firstpage

971

Lastpage

990

Abstract

The use of high plasma density and low gas density, a recent trend in plasma-assisted materials processing, requires a particle simulation method for plasmas and gas flows. The kinetic theory basis of the particle simulation method is first described. Based on this theoretical viewpoint, state-of-the-art probabilistic treatments of collisions are described for electron-molecule, ion-molecule, molecule-molecule, and Coulomb collisions

Keywords

Monte Carlo methods; density; digital simulation; ion-molecule collisions; materials preparation; molecule-electron collisions; molecule-molecule collisions; plasma collision processes; plasma density; plasma materials processing; plasma simulation; probability; Coulomb collisions; collision algorithm; direct simulation Monte Carlo calculations; electron+molecule collisions; gas density; gas flows; ion+molecule collisions; kinetic theory; materials processing plasmas; molecule+molecule collisions; particle in cell model; particle modeling; particle simulation method; plasma density; plasma-assisted materials processing; probability theory; rarefied gas; state-of-the-art probabilistic treatments; Computational modeling; Distribution functions; Etching; Monte Carlo methods; Plasma applications; Plasma density; Plasma materials processing; Plasma simulation; Plasma sources; Semiconductor device modeling;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.887765

Filename

887765