DocumentCode :
1412488
Title :
Process monitoring of spin-valve GMR deposition
Author :
Kools, J.C.S. ; Paranjpe, A.P. ; Schwartz, P.V. ; Bubber, R. ; Bergner, B. ; Kula, W. ; Rijks, Th.G.S.M.
Author_Institution :
CVC, Fremont, CA, USA
Volume :
34
Issue :
4
fYear :
1998
fDate :
7/1/1998 12:00:00 AM
Firstpage :
945
Lastpage :
947
Abstract :
A phenomenological description of the conductance of a spin-valve structure is developed and compared to numerical solutions for the Boltzmann equation. Based on the phenomenological description, a method is presented to measure the controllability of physical vapor deposition of sub-100 Å Cu films with better than 0.5 Å accuracy
Keywords :
Boltzmann equation; Permalloy; copper; giant magnetoresistance; magnetic multilayers; vapour deposition; Boltzmann equation; Cu-NiFe; giant magnetoresistance; phenomenological description; physical vapor deposition; spin-valve structure; Antiferromagnetic materials; Automatic control; Conductivity; Controllability; Electrons; Magnetic heads; Magnetic materials; Measurement standards; Monitoring; Nonhomogeneous media;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.706322
Filename :
706322
Link To Document :
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