DocumentCode
1412498
Title
Modeling of negative ion production in hydrogen plasmas
Author
Fukumasa, Osamu
Author_Institution
Dept. of Electr. & Electron. Eng., Yamaguchi Univ., Ube, Japan
Volume
28
Issue
3
fYear
2000
fDate
6/1/2000 12:00:00 AM
Firstpage
1009
Lastpage
1015
Abstract
Effects of cesium vapor injection on H- production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. The results with a focus on electron temperature and gas pressure dependence on H- volume production are presented and discussed. Considering H- surface production due to H atoms and positive hydrogen ions, enhancement of H- production and pressure dependence of H- production observed experimentally are qualitatively well reproduced in the model calculation, where stripping loss in the extraction and acceleration regions is taken into account. For enhancement of H$production, so-called electron cooling in the source region, as well as in the extraction region, is not so effective if plasma parameters are initially optimized with the use of a magnetic filter.
Keywords
hydrogen ions; ion sources; negative ions; plasma pressure; plasma simulation; plasma temperature; Cs; Cs vapor; H; H plasmas; H- production; electron cooling; electron temperature; gas pressure; magnetic filter; modeling; numerical study; particle balance equations; plasma parameters; steady-state discharge plasmas; stripping loss; tandem volume source; Electrons; Equations; Fault location; Hydrogen; Plasma sources; Plasma temperature; Production; Steady-state; Surface discharges; Temperature dependence;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.887769
Filename
887769
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