• DocumentCode
    1412498
  • Title

    Modeling of negative ion production in hydrogen plasmas

  • Author

    Fukumasa, Osamu

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Yamaguchi Univ., Ube, Japan
  • Volume
    28
  • Issue
    3
  • fYear
    2000
  • fDate
    6/1/2000 12:00:00 AM
  • Firstpage
    1009
  • Lastpage
    1015
  • Abstract
    Effects of cesium vapor injection on H- production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. The results with a focus on electron temperature and gas pressure dependence on H- volume production are presented and discussed. Considering H- surface production due to H atoms and positive hydrogen ions, enhancement of H- production and pressure dependence of H- production observed experimentally are qualitatively well reproduced in the model calculation, where stripping loss in the extraction and acceleration regions is taken into account. For enhancement of H$production, so-called electron cooling in the source region, as well as in the extraction region, is not so effective if plasma parameters are initially optimized with the use of a magnetic filter.
  • Keywords
    hydrogen ions; ion sources; negative ions; plasma pressure; plasma simulation; plasma temperature; Cs; Cs vapor; H; H plasmas; H- production; electron cooling; electron temperature; gas pressure; magnetic filter; modeling; numerical study; particle balance equations; plasma parameters; steady-state discharge plasmas; stripping loss; tandem volume source; Electrons; Equations; Fault location; Hydrogen; Plasma sources; Plasma temperature; Production; Steady-state; Surface discharges; Temperature dependence;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.887769
  • Filename
    887769