Domain structures supported by micron-sized patterned Co/Cu multilayers with AF and FM coupling

Author

Aitchison, P.R. ; Chapman, J.N. ; Kirk, K.J. ; Jardine, D.B. ; Evetts, J.E.

Author_Institution

Dept. of Phys. & Astron., Glasgow Univ., UK

Volume

34

Issue

4

fYear

1998

fDate

7/1/1998 12:00:00 AM

Firstpage

1012

Lastpage

1014

Abstract

Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs

Keywords

cobalt; copper; ferromagnetic materials; magnetic domains; magnetic multilayers; magnetic switching; magnetisation reversal; remanence; sputtered coatings; transmission electron microscopy; AF coupling; AF-coupled multilayers; Co-Cu; Cu spacer layers; FM coupled multilayers; FM coupling; Lorentz imaging mode; TEM; dc magnetron sputtering; differential phase contrast; domain structures; flux closure geometries; lift-off patterning; magnetic switching; micron-sized patterned Co/Cu multilayers; remanent state; Atomic force microscopy; Magnetic domains; Magnetic films; Magnetic flux; Magnetic force microscopy; Magnetic multilayers; Magnetic switching; Magnetization; Nonhomogeneous media; Transmission electron microscopy;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.706341

Filename

706341