DocumentCode
1412719
Title
Hybrid ferromagnet-semiconductor nonvolatile gate
Author
Johnson, Mark ; Bennett, Brian R. ; Yang, M.J. ; Miller, M.M. ; Shanabrook, B.V.
Author_Institution
Naval Res. Lab., Washington, DC, USA
Volume
34
Issue
4
fYear
1998
fDate
7/1/1998 12:00:00 AM
Firstpage
1054
Lastpage
1059
Abstract
A novel magnetoelectronic device for digital applications is presented, and characteristics of a Nonvolatile Random Access Memory (NRAM) cell are discussed. A prototype cell with micron dimensions and with binary output states of 0 and 80 mV has been demonstrated at room temperature. Device fabrication requires only two lithographic levels, one for a Hall cross and one for an electrically isolated, microstructured bistable ferromagnetic film. Locally strong magnetic fringe fields from the edge of the film generate a Hall voltage in the semiconductor. The sign of the fringe field, as well as the polarity of the Hall voltage, is switched by reversing the in-plane magnetization of the ferromagnet. The device is inverse scalable: output characteristics improve as dimensions shrink. A high-density, solid state NRAM with nsec read, write and access times could replace both DRAM and magnetic disk drives in most computer environments, eliminating redundancy in memory systems
Keywords
hybrid integrated circuits; magnetic storage; magnetoelectric effects; random-access storage; Hall cross; Hall voltage; Nonvolatile Random Access Memory cell; binary output states; hybrid ferromagnet-semiconductor nonvolatile gate; in-plane magnetization reversal; locally strong magnetic fringe fields; magnetoelectronic device; micron dimensions; microstructured bistable ferromagnetic film; polarity; Fabrication; Magnetic films; Magnetic semiconductors; Magnetoelectronics; Nonvolatile memory; Prototypes; Random access memory; Semiconductor films; Temperature; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.706355
Filename
706355
Link To Document