DocumentCode :
1413435
Title :
Integration of Self-Assembled Redox Molecules in Flash Memory Devices
Author :
Shaw, Jonathan ; Zhong, Yu-Wu ; Hughes, Kevin J. ; Hou, Tuo-Hung ; Raza, Hassan ; Rajwade, Shantanu ; Bellfy, Julie ; Engstrom, James R. ; Abruña, Héctor D. ; Kan, Edwin Chihchuan
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY, USA
Volume :
58
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
826
Lastpage :
834
Abstract :
Self-assembled monolayers (SAMs) of either ferrocenecarboxylic acid or 5-(4-Carboxyphenyl)-10,15,20-triphenyl-porphyrin-Co(II) (CoP) with a high- dielectric were integrated into the Flash memory gate stack. The molecular reduction-oxidation (redox) states are used as charge storage nodes to reduce charging energy and memory window variations. Through the program/erase operations over tunneling barriers, the device structure also provides a unique capability to measure the redox energy without strong orbital hybridization of metal electrodes in direct contact. Asymmetric charge injection behavior was observed, which can be attributed to the Fermi-level pinning between the molecules and the high- dielectric. With increasing redox molecule density in the SAM, the memory window exhibits a saturation trend. Three programmable molecular orbital states, i.e., CoP0, CoP1-, and CoP2-, can be experimentally observed through a charge-based nonvolatile memory structure at room temperature. The electrostatics is determined by the alignment between the highest occupied or the lowest unoccupied molecular orbital (HOMO or LUMO, respectively) energy levels and the charge neutrality level of the surrounding dielectric. Engineering the HOMO-LUMO gap with different redox molecules can potentially realize a multibit memory cell with less variation.
Keywords :
electrostatics; flash memories; oxidation; reduction (chemical); 5-(4-Carboxyphenyl)-10,15,20-triphenyl-porphyrin-Co(II); Fermi-level pinning; HOMO energy level; LUMO energy level; asymmetric charge injection; charge-based nonvolatile memory structure; either ferrocenecarboxylic acid; electrostatics; flash memory devices; highest occupied molecular orbital; lowest unoccupied molecular orbital; molecular reduction-oxidation states; self-assembled monolayers; self-assembled redox molecules; Coulomb blockade effect; high-$kappa$ dielectric; nonvolatile memory devices; reduction–oxidation (redox)-active molecules; self-assembled monolayer (SAM);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2097266
Filename :
5676192
Link To Document :
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