Title :
The distribution of blocking temperature in NiFe-RuxRh yMn bilayers
Author :
Araki, S. ; Sano, M. ; Ohta, M. ; Tsuchiya, Y. ; Noguchi, K. ; Morita, H. ; Matsuzaki, M.
Author_Institution :
Data Storage Components Bus. Group, TDK Corp., Nagano, Japan
fDate :
7/1/1998 12:00:00 AM
Abstract :
We report the distribution profiles of blocking temperature (Tb) in RuxRhyMn-NiFe interfaces with comparisons of FeMn, NiMn, and PtMn. The distribution of Tb at the temperature around 120~150°C decreased with increasing Rh content. The FWHM of the distribution profile in Ru4Rh14 Mn is one half of that in ordered phase NiMn and PtMn. The unblocked ratio at 125°C decreases with increasing Rh content, and becomes a minimum in Ru4Rh14Mn, which is one half of FeMn
Keywords :
antiferromagnetic materials; exchange interactions (electron); giant magnetoresistance; iron alloys; magnetic heads; magnetic thin films; manganese alloys; nickel alloys; rhodium alloys; ruthenium alloys; 120 to 150 degC; NiFe-RuRhMn; Rh content; antiferromagnetic films; bilayers; blocking temperature distribution; exchange coupling; giant magnetoresistance; spin valve; Giant magnetoresistance; Glass; Helium; Magnetic heads; Memory; Nonhomogeneous media; Plasma properties; Plasma temperature; Temperature dependence; Temperature distribution;
Journal_Title :
Magnetics, IEEE Transactions on
