Title :
A Physics-Based Engineering Methodology for Calculating Soft Error Rates of Bulk CMOS and SiGe Heterojunction Bipolar Transistor Integrated Circuits
Author :
Fulkerson, David E.
Author_Institution :
Honeywell, Plymouth, MN, USA
Abstract :
This paper describes a new methodology for characterizing the electrical behavior and soft error rate (SER) of CMOS and SiGe HBT integrated circuits that are struck by ions. A typical engineering design problem is to calculate the SER of a critical path that commonly includes several circuits such as an input buffer, several logic gates, logic storage, clock tree circuitry, and an output buffer. Using multiple 3D TCAD simulations to solve this problem is too costly and time-consuming for general engineering use. The new and simple methodology handles the problem with ease by simple SPICE simulations. The methodology accurately predicts the measured threshold linear energy transfer (LET) of a bulk CMOS SRAM. It solves for circuit currents and voltage spikes that are close to those predicted by expensive 3D TCAD simulations. It accurately predicts the measured event cross-section vs. LET curve of an experimental SiGe HBT flip-flop. The experimental cross section vs. frequency behavior and other subtle effects are also accurately predicted.
Keywords :
CMOS integrated circuits; SPICE; bipolar integrated circuits; heterojunction bipolar transistors; SRAM; clock tree circuitry; electrical behavior; heterojunction bipolar transistor integrated circuits; input buffer; logic gates; logic storage; output buffer; physics-based engineering methodology; single-event upset; soft error rates; threshold linear energy transfer; Bipolar integrated circuits; Buffer storage; CMOS integrated circuits; CMOS logic circuits; Circuit simulation; Error analysis; Germanium silicon alloys; Heterojunction bipolar transistors; Logic gates; Silicon germanium; Integrated circuit; radiation; single-event upset (SEU); soft error rate (SER);
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2009.2038267