Material and tribological properties of a-C:H film by plasma CVD for a disk overcoat

Author

Toyaguchi, T. ; Yamamoto, Takayuki

Author_Institution

File Memory Lab., Fujitsu Labs. Ltd., Atsugi, Japan

Volume

34

Issue

4

fYear

1998

fDate

7/1/1998 12:00:00 AM

Firstpage

1741

Lastpage

1743

Abstract

Amorphous hydrogenated carbon (a-C:H) film deposited by plasma chemical vapor deposition (PCVD) using toluene as a monomer is durable enough for a very thin magnetic disk overcoat. In this paper, we discuss the effect of deposition conditions on material and mechanical properties of this film. Lowering deposition gas pressure increases the amount of sp³ bonded carbon and the hardness, and decreases the hydrogen content of the film. Increasing bias voltage leads to the same effects. Properties of a PCVD film could be well controlled by the hydrogen content besides the amount of sp³ bonded carbon. PCVD films were more durable than sputtered a-C:H films of less than 10 nm thickness. A PCVD film enables us to reduce disk overcoat thickness

Keywords

amorphous state; carbon; hardness; hydrogen; magnetic disc storage; noncrystalline structure; plasma CVD; wear resistant coatings; 10 nm; C:H; a-C:H film; amorphous hydrogenated carbon; bias voltage; deposition conditions; deposition gas pressure; disk overcoat; disk overcoat thickness; hardness; hydrogen content; plasma CVD; plasma chemical vapor deposition; sp³ bonded carbon; thin magnetic disk overcoat; toluene; tribological properties; Amorphous magnetic materials; Amorphous materials; Bonding; Chemical vapor deposition; Hydrogen; Magnetic films; Magnetic materials; Plasma chemistry; Plasma materials processing; Plasma properties;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.706690

Filename

706690