DocumentCode
1414797
Title
Magnetization, magnetostriction and film stress of Fe monolayers on W(100)
Author
Sander, D. ; Enders, A. ; Kirschner, J.
Author_Institution
Max-Planck-Inst. fur Mikrostrukturphys., Halle, Germany
Volume
34
Issue
4
fYear
1998
fDate
7/1/1998 12:00:00 AM
Firstpage
2015
Lastpage
2017
Abstract
Film stress, magnetization and magnetoelastic coupling are measured in situ by a simple optical deflection technique. This technique reveals that 2 nm thin Fe films grown on W(100) show magnetoelastic coupling that differs in both magnitude and sign from Fe bulk data. Stress contributions to the magnetoelastic coupling are discussed to describe this peculiar magnetoelastic behavior that is observed for Fe films thinner than 20 nm
Keywords
bending; ferromagnetic materials; internal stresses; iron; magnetic epitaxial layers; magnetisation; magnetoelastic effects; magnetostriction; monolayers; 2 nm; Fe; Poisson ratio; W; W(100) substrate; Young´s modulus; cantilever bending; epitaxial misfit; film stress; in situ measurement; magnetization; magnetoelastic coupling; magnetostriction; optical deflection technique; thin Fe monolayers; ultrathin films; Couplings; Iron; Magnetic field induced strain; Magnetic films; Magnetization; Magnetostriction; Optical films; Strain measurement; Stress measurement; Substrates;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.706775
Filename
706775
Link To Document