• DocumentCode
    1416491
  • Title

    Adaptive grid generation for VSLI device simulation

  • Author

    Coughran, W.M., Jr. ; Pinto, Mark R. ; Smith, R. Kent

  • Author_Institution
    AT&T Bell Lab., Murray Hill, NJ, USA
  • Volume
    10
  • Issue
    10
  • fYear
    1991
  • fDate
    10/1/1991 12:00:00 AM
  • Firstpage
    1259
  • Lastpage
    1275
  • Abstract
    A grid refinement methodology suitable for arbitrary spatial dimensions and geometries is developed. Using just the structural description of a device-specified by the user or taken directly from the output of a process simulator-strategies for creating an initial grid are proposed, embodying whatever knowledge the simulator can have about how the solution will behave. After solving the PDEs, a grid is adapted by examining the local error involved in the discretization process. A set of procedures is proposed for this purpose and shown to be nearly optimal in terms of cost and efficiency. The key to implementing a robust and efficient scheme lies in the choice of a suitable error indicator; it is shown that some of the more obvious candidates can perform quite poorly. The initial grid construction and error indicator schemes are used to show how the full adaptation procedure works on some practical examples
  • Keywords
    VLSI; digital simulation; electronic engineering computing; error analysis; semiconductor device models; VSLI device simulation; adaptive grid generation; discretization process; error indicator; grid refinement methodology; static drift diffusion equations; structural description; Automatic control; Doping profiles; Equations; Geometry; Grid computing; Mesh generation; Process control; Semiconductor device modeling; Solid modeling; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/43.88922
  • Filename
    88922