DocumentCode :
1416491
Title :
Adaptive grid generation for VSLI device simulation
Author :
Coughran, W.M., Jr. ; Pinto, Mark R. ; Smith, R. Kent
Author_Institution :
AT&T Bell Lab., Murray Hill, NJ, USA
Volume :
10
Issue :
10
fYear :
1991
fDate :
10/1/1991 12:00:00 AM
Firstpage :
1259
Lastpage :
1275
Abstract :
A grid refinement methodology suitable for arbitrary spatial dimensions and geometries is developed. Using just the structural description of a device-specified by the user or taken directly from the output of a process simulator-strategies for creating an initial grid are proposed, embodying whatever knowledge the simulator can have about how the solution will behave. After solving the PDEs, a grid is adapted by examining the local error involved in the discretization process. A set of procedures is proposed for this purpose and shown to be nearly optimal in terms of cost and efficiency. The key to implementing a robust and efficient scheme lies in the choice of a suitable error indicator; it is shown that some of the more obvious candidates can perform quite poorly. The initial grid construction and error indicator schemes are used to show how the full adaptation procedure works on some practical examples
Keywords :
VLSI; digital simulation; electronic engineering computing; error analysis; semiconductor device models; VSLI device simulation; adaptive grid generation; discretization process; error indicator; grid refinement methodology; static drift diffusion equations; structural description; Automatic control; Doping profiles; Equations; Geometry; Grid computing; Mesh generation; Process control; Semiconductor device modeling; Solid modeling; Very large scale integration;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/43.88922
Filename :
88922
Link To Document :
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