DocumentCode :
1416696
Title :
Uniform and Sampled Bragg Gratings in SOI Strip Waveguides With Sidewall Corrugations
Author :
Wang, Xu ; Shi, Wei ; Vafaei, Raha ; Jaeger, Nicolas A F ; Chrostowski, Lukas
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC, Canada
Volume :
23
Issue :
5
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
290
Lastpage :
292
Abstract :
We have demonstrated uniform and sampled Bragg gratings in silicon-on-insulator strip waveguides with symmetric sidewall corrugations. The fabrication is based on 193-nm deep ultraviolet lithography using a single mask. The measured reflection spectra of sampled gratings exhibit ten usable peaks spaced by 4.2 nm, and show good agreement with theoretical predictions.
Keywords :
Bragg gratings; optical fabrication; optical waveguides; silicon-on-insulator; ultraviolet lithography; Bragg gratings; SOI strip waveguides; reflection spectra; sidewall corrugations; silicon-on-insulator strip waveguides; ultraviolet lithography; wavelength 193 nm; Bragg gratings; sampled gratings; silicon-on-insulator; strip waveguides;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2010.2103305
Filename :
5678626
Link To Document :
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