DocumentCode :
1416768
Title :
Interdigit 4H-SiC Vertical Schottky Diode for Betavoltaic Applications
Author :
Sciuto, Antonella ; D´Arrigo, G. ; Roccaforte, F. ; Mazzillo, M. ; Spinella, R.C. ; Raineri, V.
Author_Institution :
Inst. for Microelectron. & Microsyst., Nat. Council of Res., Catania, Italy
Volume :
58
Issue :
3
fYear :
2011
fDate :
3/1/2011 12:00:00 AM
Firstpage :
593
Lastpage :
599
Abstract :
We demonstrated a 4H-SiC vertical Schottky diode for betavoltaic application using interdigit front metallization. A relevant increase in the betavoltaic short-circuit current with respect to a device with a continuous standard front electrode was achieved with this novel layout allowing to collect also low-energy electrons. In particular, by irradiating the device with a monochromatic electron beam (e-beam) of 17 keV, an internal gain that is 1.4 times higher than in conventional devices was obtained. An open-circuit voltage of ~1 V was obtained for an illumination e-beam current density of 10-8 A/cm2.
Keywords :
Schottky diodes; current density; electron beams; metallisation; short-circuit currents; silicon compounds; wide band gap semiconductors; 4H-SiC vertical Schottky diode; SiC; betavoltaic applications; betavoltaic short-circuit current; electron volt energy 17 keV; illumination e-beam current density; interdigit front metallization; low-energy electrons; monochromatic electron beam irradiation; 4H-SiC; Betavoltaic; electron-beam-induced current (EBIC);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2094622
Filename :
5678638
Link To Document :
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