DocumentCode :
1417650
Title :
Byproduct identification and mechanism determination in plasma chemical decomposition of trichloroethylene
Author :
Futamura, Shigeru ; Yamamoto, Toshiaki
Author_Institution :
Nat. Inst. for Resources & Environ., Ibaraki, Japan
Volume :
33
Issue :
2
fYear :
1997
Firstpage :
447
Lastpage :
453
Abstract :
Plasma chemical behavior of trichloroethylene (TCE) was investigated with a packed-bed ferroelectric pellet reactor and a pulsed corona reactor. Volatile byproducts were identified by gas chromatography and mass spectrometry (GC-MS), and it was shown that reactor type, TCE concentration, flow rate, background gas, and moisture affected TCE decomposition efficiency and product distribution. Byproduct distributions in nitrogen and the negative effect of oxygen and moisture on TCE decomposition efficiency show that TCE decomposition proceeds via initial elimination of chlorine and hydrogen atoms, the addition of which to TCE accelerates its decomposition. Active oxygen species like OH radical is less likely involved in the initial step of TCE decomposition in plasma. Triplet oxygen molecules (3O2) scavenge intermediate carbon radicals derived from TCE decomposition to give much lower yields of organic byproducts
Keywords :
chromatography; corona; mass spectroscopy; plasma applications; plasma devices; waste disposal; 3O2; OH radical; background gas; byproduct identification; chlorine atoms; decomposition efficiency; flow rate; gas chromatography; hydrogen atoms; intermediate carbon radicals; mass spectrometry; mechanism determination; moisture; organic byproducts; packed-bed ferroelectric pellet reactor; plasma chemical decomposition; plasma reactors; product distribution; pulsed corona reactor; trichloroethylene; triplet oxygen molecules; volatile byproducts; Chemical reactors; Corona; Ferroelectric materials; Gas chromatography; Hydrogen; Inductors; Mass spectroscopy; Moisture; Nitrogen; Plasma chemistry;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.568009
Filename :
568009
Link To Document :
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