DocumentCode :
1417660
Title :
Dynamic-Moving-Window Scheme for Virtual-Metrology Model Refreshing
Author :
Wu, Wei-Ming ; Cheng, Fan-tien ; Kong, Fan-Wei
Author_Institution :
Inst. of Manuf. Inf. & Syst., Nat. Cheng Kung Univ., Tainan, Taiwan
Volume :
25
Issue :
2
fYear :
2012
fDate :
5/1/2012 12:00:00 AM
Firstpage :
238
Lastpage :
246
Abstract :
Virtual metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool without physical metrology operations. Historical data is used to produce the initial VM models, and then these models are applied to operating in a process drift or shift environment. The accuracy of VM highly depends on the modeling samples adopted during initial-creating and online-refreshing periods. Since large resources are required, design-of-experiments may not be performed. In that case, how could we guarantee the stability of the models and predictions as they move into the unknown environment? Conventionally, static-moving-window (SMW) schemes with a fixed window size are adopted in the online-refreshing period. The purpose of this paper is to propose a dynamic-moving-window (DMW) scheme for VM model refreshing to enhance prediction accuracy. The DMW scheme adds a new sample into the model and applies a clustering technology to do similarity clustering. Next, the number of elements in each cluster is checked. If the largest number of the elements is greater than the predefined threshold, then the oldest sample in the cluster with the largest population is deleted. Both the adaptive-resonance-theory-2 and the newly proposed weighted-Euclidean-distance methods are applied to do similarity clustering.
Keywords :
ART neural nets; electronic engineering computing; liquid crystal displays; pattern clustering; production engineering computing; semiconductor device manufacture; semiconductor device models; thin film transistors; virtual manufacturing; ART2 neural network; DMW scheme; SMW schemes; VM models; adaptive-resonance-theory-2; clustering technology; design-of-experiments; dynamic-moving-window scheme; fifth-generation TFT-LCD; fifth-generation thin-film transistor liquid crystal display; fixed window size; historical data; manufacturing quality; online-refreshing periods; process drift; process tool; static-moving-window schemes; virtual-metrology model refreshing; weighted-Euclidean-distance methods; Accuracy; Adaptation models; Correlation; Data models; Metrology; Predictive models; US Department of Energy; Dynamic-moving-window (DMW) scheme; model refreshing; static-moving-window (SMW) scheme; virtual metrology (VM); weighted-Euclidean-distance (WED) method;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2012.2183398
Filename :
6126059
Link To Document :
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