Title :
Normally Off AlGaN/GaN Metal–2DEG Tunnel-Junction Field-Effect Transistors
Author :
Yuan, Li ; Chen, Hongwei ; Chen, Kevin J.
Author_Institution :
Dept. of Electron. & Comput. Eng., Hong Kong Univ. of Sci. & Technol., Kowloon, China
fDate :
3/1/2011 12:00:00 AM
Abstract :
We present the first AlGaN/GaN tunnel-junction FETs (TJ-FETs) featuring a metal-2-D-electron-gas (2DEG) Schottky tunnel junction at the source. The control of the source-to-drain current flow is realized through a gate-controlled tunnel junction instead of a gate-controlled 2DEG channel. The TJ-FETs exhibit normally off operation (Vth = +1.35 V) in an otherwise normally on as-grown sample. The unique high-density 2DEG in AlGaN/GaN heterostructures enables the formation of a Schottky tunnel barrier with nanometer-scale barrier thickness even with a large Schottky barrier height (e.g., ~0.8 eV). In the OFF state, the source Schottky junction provides natural reverse-blocking capability, resulting in significant leakage reduction and low OFF-state current. A drive current of 326 mA/mm, a high ION/IOFF ratio (1010), and a low subthreshold swing (89 mV/dec) are obtained.
Keywords :
Schottky barriers; aluminium compounds; field effect transistors; gallium compounds; tunnel transistors; AlGaN-GaN; Schottky tunnel barrier; TJ-FET; gate-controlled tunnel junction; leakage reduction; low OFF-state current; low subthreshold swing; metal-2D-electron-gas Schottky tunnel junction; nanometer-scale barrier thickness; natural reverse-blocking capability; source-to-drain current flow; tunnel-junction field-effect transistors; voltage -1.35 V; voltage 1.35 V; AlGaN/GaN HEMT; Schottky source; metal–2-D-electron-gas junction; tunnel FET;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2010.2095823