• DocumentCode
    1418944
  • Title

    High Electrical Performance of Wet-Processed Indium Zinc Oxide Thin-Film Transistors

  • Author

    Park, Kyung-Bae ; Seon, Jong-Baek ; Kim, Gun Hee ; Yang, Mino ; Koo, Bonwon ; Kim, Hyun Jae ; Ryu, Myung-Kwan ; Lee, Sang-Yoon

  • Author_Institution
    Display Lab., Samsung Adv. Inst. of Technol., Yongin, South Korea
  • Volume
    31
  • Issue
    4
  • fYear
    2010
  • fDate
    4/1/2010 12:00:00 AM
  • Firstpage
    311
  • Lastpage
    313
  • Abstract
    We developed thin-film transistors (TFTs) that use solution-processed amorphous indium zinc oxide for the channels in an all-photolithographic process. The transistors, which operate in depletion mode, have excellent transfer characteristics, including saturation mobility of 6.57 cm2/ V??s, threshold voltages of - 0.30 V, turn-on voltages of -1.50 V, on/off ratios of 109, and inverse subthreshold slopes of 0.15 V/dec. We measured the time, temperature, gate voltage, and drain-voltage dependence of the threshold voltage shift, which was 2.16 V under stress conditions. This is nearly the same as that of conventional amorphous silicon TFTs.
  • Keywords
    amorphous semiconductors; indium compounds; thin film transistors; InZnO; all-photolithographic process; voltage -0.30 V; voltage -1.5 V; voltage 2.16 V; wet-processed thin-film transistors; Display device; indium zinc oxide (IZO); solution process; thin-film transistor (TFT);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2010.2040130
  • Filename
    5415590