DocumentCode :
1418944
Title :
High Electrical Performance of Wet-Processed Indium Zinc Oxide Thin-Film Transistors
Author :
Park, Kyung-Bae ; Seon, Jong-Baek ; Kim, Gun Hee ; Yang, Mino ; Koo, Bonwon ; Kim, Hyun Jae ; Ryu, Myung-Kwan ; Lee, Sang-Yoon
Author_Institution :
Display Lab., Samsung Adv. Inst. of Technol., Yongin, South Korea
Volume :
31
Issue :
4
fYear :
2010
fDate :
4/1/2010 12:00:00 AM
Firstpage :
311
Lastpage :
313
Abstract :
We developed thin-film transistors (TFTs) that use solution-processed amorphous indium zinc oxide for the channels in an all-photolithographic process. The transistors, which operate in depletion mode, have excellent transfer characteristics, including saturation mobility of 6.57 cm2/ V??s, threshold voltages of - 0.30 V, turn-on voltages of -1.50 V, on/off ratios of 109, and inverse subthreshold slopes of 0.15 V/dec. We measured the time, temperature, gate voltage, and drain-voltage dependence of the threshold voltage shift, which was 2.16 V under stress conditions. This is nearly the same as that of conventional amorphous silicon TFTs.
Keywords :
amorphous semiconductors; indium compounds; thin film transistors; InZnO; all-photolithographic process; voltage -0.30 V; voltage -1.5 V; voltage 2.16 V; wet-processed thin-film transistors; Display device; indium zinc oxide (IZO); solution process; thin-film transistor (TFT);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2010.2040130
Filename :
5415590
Link To Document :
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