DocumentCode
142042
Title
Design technology co-optimization for 10 nm and beyond
Author
Kikkawa, Takamaro ; Joshi, Rajiv
Author_Institution
Hiroshima University
fYear
2014
fDate
15-17 Sept. 2014
Firstpage
1
Lastpage
1
Abstract
Silicon-based integrated circuits technologies have reached the extreme level to satisfy the demand of the present society. This requires design technology co-optimization and introduction of new semiconductor materials. The three papers in this session address various facets of technologies for 10 nm and beyond.
Keywords
CNTFETs; Educational institutions; Integrated circuit technology; Integrated circuits; Photonic band gap; Semiconductor materials; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Custom Integrated Circuits Conference (CICC), 2014 IEEE Proceedings of the
Conference_Location
San Jose, CA, USA
Type
conf
DOI
10.1109/CICC.2014.6946105
Filename
6946105
Link To Document