DocumentCode :
1423819
Title :
Device and IC Characterization Above 100 GHz
Author :
Yau, Kenneth H K ; Dacquay, Eric ; Sarkas, Ioannis ; Voinigescu, Sorin P.
Author_Institution :
ECE Dept., Univ. of Toronto, Toronto, ON, Canada
Volume :
13
Issue :
1
fYear :
2012
Firstpage :
30
Lastpage :
54
Abstract :
Due to the aggressive scaling of metal-oxide-semiconductor field-effect transistors (MOSFETs) and silicon germanium SiGe heterojunction bipolar transistors (HBTs), silicon-based circuits operating above 100 GHz are becoming a reality. However, at present, most, if not all semiconductor foundries extract their transistor and passive device models from measurements conducted below 110 GHz and often below 65 GHz. In order to reduce the number of design iterations, accurate S-parameter characterization techniques above 100 GHz are required for active and passive devices such that compact models may be developed and verified on representative circuits.
Keywords :
MOSFET; S-parameters; elemental semiconductors; heterojunction bipolar transistors; semiconductor device models; silicon; silicon compounds; HBT; IC characterization; MOSFET; S-parameter characterization technique; Si; SiGe; heterojunction bipolar transistor; metal-oxide-semiconductor field-effect transistor; silicon-based circuit; Foundries; Frequency measurement; Heterojunction bipolar transistors; Integrated circuit modeling; Scattering parameters; Semiconductor device measurement; Silicon germanium;
fLanguage :
English
Journal_Title :
Microwave Magazine, IEEE
Publisher :
ieee
ISSN :
1527-3342
Type :
jour
DOI :
10.1109/MMM.2011.2173869
Filename :
6132311
Link To Document :
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