• DocumentCode
    1424154
  • Title

    “Non-Hydrogen-Transport” Characteristics of Dynamic Negative-Bias Temperature Instability

  • Author

    Teo, Zhi Qiang ; Ang, Diing Shenp ; Ng, Chee Mang

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
  • Volume
    31
  • Issue
    4
  • fYear
    2010
  • fDate
    4/1/2010 12:00:00 AM
  • Firstpage
    269
  • Lastpage
    271
  • Abstract
    It has been proposed that negative-bias temperature instability (NBTI) is driven by interface-state generation, rate limited by hydrogen transport. In this letter, we examine dynamic NBTI characteristics and present evidence which does not conform to a hydrogen-transport model. It is observed that the amount of recovery of the threshold voltage shift |ΔVt| remains constant, independent of the number of stress/recovery (SR) cycles. This behavior is inconsistent with the hydrogen-transport model, which stipulates that the amount of |ΔVt| recovery should decrease with increase in the number of SR cycles. Results show that dynamic NBTI is made up of a symmetric "switching hole-trap" mechanism superimposed on a background of relatively permanent deep-level hole trap and interface-state generation.
  • Keywords
    deep levels; hole traps; hydrogen; interface states; switching; dynamic negative-bias temperature instability; hydrogen-transport model; interface-state generation; nonhydrogen-transport characteristics; permanent deep-level hole trap; stress-recovery cycles; symmetric switching hole-trap mechanism; threshold voltage shift; Dispersive transport; hole traps; interface traps; reaction–diffusion; ultrafast switching measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2039848
  • Filename
    5419107