Title :
Operational analysis of synchrotron-based X-ray lithography: comparison of 200 mm and 300 mm wafer flows
Author :
White, K.P. ; Trybula, W.J.
Author_Institution :
University of Virginia
fDate :
10/1/2000 12:00:00 AM
Keywords :
Discrete event simulation; Frequency estimation; Microelectronics; Performance analysis; Process design; Semiconductor device modeling; State estimation; Synchrotron radiation; Throughput; X-ray lithography;
Journal_Title :
Electronics Packaging Manufacturing, IEEE Transactions on
DOI :
10.1109/TEPM.2000.895064
