DocumentCode :
1424658
Title :
Operational analysis of synchrotron-based x-ray lithography: Simulation model of wafer flows
Author :
White, K. Preston, Jr. ; Trybula, Walter J.
Author_Institution :
University of Virginia
Volume :
23
Issue :
4
fYear :
2000
fDate :
10/1/2000 12:00:00 AM
Firstpage :
238
Lastpage :
238
Keywords :
Analytical models; Data mining; Databases; Discrete event simulation; Frequency estimation; Logic; Process design; Semiconductor device modeling; Synchrotron radiation; X-ray lithography;
fLanguage :
English
Journal_Title :
Electronics Packaging Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
1521-334X
Type :
jour
DOI :
10.1109/TEPM.2000.895065
Filename :
895065
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1424658
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