DocumentCode :
1426651
Title :
Engineering applications of plasma science
Author :
Gilmore, Mark
Author_Institution :
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
Volume :
17
Issue :
3
fYear :
1998
Firstpage :
4
Lastpage :
8
Abstract :
Plasmas are important in such diverse fields as astrophysics, controlled fusion research, semiconductor manufacturing and laser technology. Plasma science incorporates skills from electromagnetics, thermodynamics, materials science, chemistry, electronics, mechanical design, vacuum technology and computer modeling. Plasma is involved in up to 30% of the steps in fabricating today´s microprocessors. Microwave tubes are a multibillion dollar market worldwide. Plasma processing within integrated circuit manufacturing is a $2 billion/year industry in the United States alone. The author discusses some engineering applications of plasma science, including: etching; deposition/coating; surface treatment; microwave vacuum tubes; pollution and hazardous waste processing; lasers; coronas
Keywords :
corona; fusion reactors; microwave tubes; plasma CVD; plasma CVD coatings; plasma applications; plasma confinement; pollution control; sputter etching; surface treatment; vacuum tubes; astrophysics; chemistry; coating; computer modeling; controlled fusion research; coronas; deposition; electromagnetics; electronics; engineering applications; etching; hazardous waste processing; integrated circuit manufacture; laser technology; lasers; materials science; mechanical design; microprocessors; microwave tubes; microwave vacuum tubes; plasma processing; plasma science; pollution; semiconductor manufacturing; surface treatment; thermodynamics; vacuum technology; Application software; Chemical technology; Integrated circuit technology; Laser theory; Masers; Materials science and technology; Nuclear and plasma sciences; Plasma applications; Plasma chemistry; Plasma materials processing;
fLanguage :
English
Journal_Title :
Potentials, IEEE
Publisher :
ieee
ISSN :
0278-6648
Type :
jour
DOI :
10.1109/45.714609
Filename :
714609
Link To Document :
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