Small-size silicon-oxynitride AWG demultiplexer operating around 725 nm

Author

Schauwecker, Bernd ; Przyrembel, Georges ; Kuhlow, Berndt ; Radehaus, Christian

Author_Institution

Tech. Univ. Chemnitz, Germany

Volume

12

Issue

12

fYear

2000

Firstpage

1645

Lastpage

1646

Abstract

We present experimental results of very compact, high /spl Delta/n, five-channel arrayed waveguide gratings (AWGs) with 5 nm-channel-spacing fabricated in the silicon-oxynitride material system. The on-chip insertion loss is about 5 dB and the crosstalk is -30 dB around 725 nm wavelength. The uniformity of the waveguide layers is better than /spl plusmn/1%,.

Keywords

demultiplexing equipment; diffraction gratings; optical arrays; optical crosstalk; optical design techniques; optical fabrication; optical losses; optical materials; optical planar waveguides; optical waveguide filters; plasma CVD; silicon compounds; 5 dB; 5 nm; 725 nm; AWG demultiplexer; SiON; SiON material system; arrayed waveguide grating demultiplexer; channel-spacing; crosstalk; fabrication; five-channel arrayed waveguide gratings; on-chip insertion loss; uniformity; waveguide layers; Arrayed waveguide gratings; Crosstalk; Dielectric materials; III-V semiconductor materials; Optical design; Optical device fabrication; Optical filters; Optical materials; Optical waveguides; Wavelength division multiplexing;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.896335

Filename

896335