DocumentCode :
1428750
Title :
Resonant Frequency Behavior of Silicon Cantilevers Coated With Nanostructured and Microcrystalline VO _2 Films
Author :
Sepulveda, Nelson ; Rua, A. ; Fernandez, F.E.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Puerto Rico, Mayaguez, Puerto Rico
Volume :
9
Issue :
3
fYear :
2010
fDate :
5/1/2010 12:00:00 AM
Firstpage :
330
Lastpage :
334
Abstract :
This letter reports the resonant frequency shifts of single crystal silicon cantilevers coated with vanadium dioxide (VO2) thin films with different average crystallite sizes during the coating´s insulator-to-metal transition (IMT) and the Young´s modulus of such thin films as a function of temperature for their monoclinic phase. The IMT was induced by sample heating, and resonant frequency shifts, close to 4% of their room temperature value, were observed for the coated cantilevers with crystallite sizes in the order of ~100 nm. The resonant frequency shifts and the hysteresis curve steepness were found to be decreased for samples with smaller VO2 film crystallite sizes and similar compositions. The crystallite sizes were controlled by the in situ annealing time to which the samples were subjected after their deposition at room temperature by pulsed laser deposition. The Young´s modulus for VO2 samples along the monoclinic (011) plane was found to be linearly dependent on the temperature. A sigmoid curve fit was used to model the behavior of the resonant frequency of the coated cantilevers during the IMT. The results presented show that the VO2 thin films can be useful in novel microscale and nanoscale electromechanical resonators in which the resonant frequency can be tuned electrically, thermally, or optically.
Keywords :
Young\´s modulus; annealing; cantilevers; elemental semiconductors; metal-insulator transition; micromechanical resonators; nanostructured materials; pulsed laser deposition; semiconductor thin films; silicon; vanadium compounds; Si; VO2; Young\´s modulus; coated cantilevers; electromechanical resonators; hysteresis curve; in situ annealing time; insulator-to-metal transition; microcrystalline films; monoclinic phase; nanostructured films; pulsed laser deposition; resonant frequency shifts; single crystal silicon cantilevers; thin films; vanadium dioxide; Mechanical resonators; phase transition; resonant frequency shift; vanadium dioxide (VO$_2$);
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2010.2044513
Filename :
5422650
Link To Document :
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