• DocumentCode
    1428864
  • Title

    A Novel Method of MOSFET Series Resistance Extraction Featuring Constant Mobility Criteria and Mobility Universality

  • Author

    Lin, Da-Wen ; Cheng, Ming-Lung ; Wang, Shyh-Wei ; Wu, Chung-Cheng ; Chen, Ming-Jer

  • Author_Institution
    Semicond. Manuf. Co., Hsinchu, Taiwan
  • Volume
    57
  • Issue
    4
  • fYear
    2010
  • fDate
    4/1/2010 12:00:00 AM
  • Firstpage
    890
  • Lastpage
    897
  • Abstract
    A method of MOSFET series resistance extraction is established in this paper. The core of this method relies on the constant mobility criteria, while for different gate lengths, it preserves the shape of universal mobility curves in the high-vertical-field regime. Consequently, the series resistance of a MOSFET can be extracted in an analytical and self-consistent manner, achieved without the knowledge of the gate oxide thickness, channel length, channel doping, or channel stress. Reasonable values of extracted series resistance are demonstrated in a wide range of gate length. Technology computer-aided design simulation further corroborates the validity of the proposed method, particularly for devices with heavily doped source/drain extensions. The constant mobility criteria with respect to the bulk charge linearization coefficient are also verified.
  • Keywords
    MOSFET; circuit CAD; MOSFET series resistance extraction; channel stress; charge linearization coefficient; computer-aided design simulation; constant mobility criteria; gate oxide thickness; high-vertical-field regime; mobility universality; universal mobility curves; Computational modeling; Degradation; Design automation; Doping; Length measurement; MOSFET circuits; Semiconductor device manufacture; Shape; Stress; Voltage; MOSFET; series resistance; universal mobility;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2010.2041508
  • Filename
    5422666