Title :
Full-wafer technology-A new approach to large-scale laser fabrication and integration
Author :
Vettiger, Peter ; Benedict, Melvin K. ; Bona, Gian-Luca ; Buchmann, Peter ; Cahoon, Edward C. ; Datwyler, Kurt ; Dietrich, Hans-Peter ; Moser, Andreas ; Seitz, Hugo K. ; Voegeli, Otto ; Webb, David J. ; Wolf, Peter
Author_Institution :
IBM Zurich Res. Lab., Ruschlikon, Switzerland
fDate :
6/1/1991 12:00:00 AM
Abstract :
A concept for full-wafer processing (FWP) and full-wafer testing (FWT) for semiconductor laser fabrication in the AlGaAs-GaAs material system is presented. The approach is based on chemically assisted ion beam etching for the laser-mirror formation. Record values for mirror scattering, optimum mirror reflectivity, and equivalence to cleaved mirrors in terms of laser threshold and efficiency have been achieved. Promising results for uniformity and reproducibility for major laser diode characteristics on processed 2-in wafers have been found. The FWP technology has been extensively used for designing test sites to determine various materials, process, and laser parameters, such as sheet resistance, ridge dimensions, lithographic alignment errors, mirror surface leakage, etc
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; integrated circuit technology; integrated optoelectronics; large scale integration; semiconductor junction lasers; sputter etching; AlGaAs-GaAs; AlGaAs-GaAs material system; III-V semiconductors; chemically assisted ion beam etching; cleaved mirrors; efficiency; full-wafer processing; full-wafer testing; integration; large-scale laser fabrication; laser diode characteristics; laser threshold; laser-mirror formation; lithographic alignment errors; mirror scattering; mirror surface leakage; optimum mirror reflectivity; ridge dimensions; semiconductor laser fabrication; sheet resistance; Chemical lasers; Chemical technology; Large-scale systems; Materials testing; Mirrors; Optical materials; Semiconductor device testing; Semiconductor lasers; Surface resistance; System testing;
Journal_Title :
Quantum Electronics, IEEE Journal of
